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Detection and modeling of leakage current in AlGaN-based deep ultraviolet light-emitting diodes

机译:AlGaN基深紫外发光二极管中泄漏电流的检测和建模

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摘要

Current-voltage (Ⅳ) characteristics of two AlGaN-based deep ultraviolet (DUV) light-emitting diodes (LEDs) with differing densities of open-core threading dislocations (nanopipes) are analyzed. A three-diode circuit is simulated to emulate the forward-bias Ⅳ characteristics of the DUV-LEDs, but is only able to accurately model the lower leakage current, lower nanopipe density DUV-LED. It was found that current leakage through the nanopipes in these structures is rectifying, despite nanopipes being previously established as inherently n-type. Using defect-sensitive etching, the nanopipes are revealed to terminate within the p-type GaN capping layer of the DUV-LEDs. The circuit model is modified to account for another p-n junction between the n-type nanopipes and the p-type GaN, and an excellent fit to the forward-bias Ⅳ characteristics of the leaky DUV-LED is achieved.
机译:分析了两种不同开芯线位错(纳米管)密度的AlGaN基深紫外(DUV)发光二极管(LED)的电流-电压(Ⅳ)特性。模拟了一个三二极管电路,以模拟DUV-LED的正向偏压Ⅳ特性,但只能准确地模拟较低的泄漏电流,较低的纳米管密度的DUV-LED。已经发现,尽管先前已将纳米管固有地确定为n型,但通过这些结构中的纳米管的电流泄漏正在纠正。使用对缺陷敏感的蚀刻,发现纳米管终止于DUV-LED的p型GaN覆盖层内。修改电路模型以解决n型纳米管和p型GaN之间的另一个p-n结,并实现了对泄漏DUV-LED的正偏Ⅳ特性的出色拟合。

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  • 来源
    《Journal of Applied Physics》 |2015年第9期|095301.1-095301.7|共7页
  • 作者单位

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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