Band offsets and trap-related electron transitions at interfaces of (100)InAs with atomic-layer deposited Al_2O_3

摘要

Spectral analysis of optically excited currents in single-crystal (100)InAs/amorphous (a-)Al_2O_3/ metal structures allows one to separate contributions stemming from the internal photoemission (IPE) of electrons into alumina and from the trapping-related displacement currents. IPE spectra suggest that the out-diffusion of In and, possibly, its incorporation in a-Al_2O_3 lead to the development of ≈0.4 eV wide conduction band (CB) tail states. The top of the InAs valence band is found at 3.45 ± O.lOeV below the alumina CB bottom, i.e., at the same energy as at the GaAs/a-Al_2O_3 interface. This corresponds to the CB and the valence band offsets at the InAs/a-Al_2O_3 interface of 3.1 ± 0.1 eV and 2.5 ±0.1 eV, respectively. However, atomic-layer deposition of alumina on InAs results in additional low-energy electron transitions with spectral thresholds in the range of 2.0-2.2 eV, which is close to the bandgap of AlAs. The latter suggests the interaction of As with Al, leading to an interlayer containing Al-As bonds providing a lower barrier for electron injection.