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Effect of low-temperature post-growth annealing on anisotropic strain in epitaxial Fe layers deposited on GaAs(001)

机译:低温后生长退火对GaAs(001)上外延Fe层中各向异性应变的影响

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摘要

We study the effect of low-temperature post growth annealing on the Fe layer in an epitaxial Fe/ GaAs(001) heterojunction. High resolution X-ray diffraction and X-ray reflectivity were used to probe the Fe layer before and after annealing. No change in morphological features like annealing induced intermixing and thickness variation of the Fe layer are observed. However, annealing leads to increase in the compressive strain and improves isotropy of the ferromagnetic layer as revealed by measuring both lateral and out-of-plane lattice components.
机译:我们研究了低温后生长退火对外延Fe / GaAs(001)异质结中Fe层的影响。高分辨率X射线衍射和X射线反射率用于探测退火前后的Fe层。没有观察到诸如退火引起的相互混合和Fe层的厚度变化的形态特征的变化。然而,如通过测量横向和面外晶格分量所揭示的,退火导致压缩应变的增加并且改善了铁磁层的各向同性。

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  • 来源
    《Journal of Applied Physics》 |2016年第24期|245304.1-245304.5|共5页
  • 作者单位

    Institute of Nanostructure and Solid State Physics, Jungiusstrasse 11, D-20355 Hamburg, Germany;

    Institute of Nanostructure and Solid State Physics, Jungiusstrasse 11, D-20355 Hamburg, Germany;

    Institute of Nanostructure and Solid State Physics, Jungiusstrasse 11, D-20355 Hamburg, Germany;

    Photon Science, Deutschen Elektronensynchrotron (DESY), Notkestrasse 85, D-22607 Hamburg, Germany;

    Institute of Nanostructure and Solid State Physics, Jungiusstrasse 11, D-20355 Hamburg, Germany;

    Institute of Nanostructure and Solid State Physics, Jungiusstrasse 11, D-20355 Hamburg, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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