Three-dimensional nanostructures on Ge/Si(100) wetting layers: Hillocks and pre-quantum dots

摘要

The annealing of sub-critical Ge wetting layers (WL ＜ 3.5 ML) initiates the formation of 3D nanostructures, whose shape and orientation is determined by the WL thickness and thus directly related to the strain energy. The emergence of these nanostructures, hillocks and pre-quantum dots, is studied by scanning tunneling microscopy. A wetting layer deposited at 350 ℃ is initially rough on the nanometer length-scale and undergoes a progressive transformation and smoothening during annealing at T ＜ 460 ℃ when vacancy lines and the 2xn reconstruction are observed. The metastable Ge WL then collapses to form 3D nanostructures whose morphology is controlled by the WL thickness: first, the hillocks, with a wedding cake-type structure where the step edges run parallel to the (110) direction, are formed from thin wetting layers, while {105}-faceted structures, called pre-quantum dots (p-QDs), are formed from thicker layers. The wetting layer thickness and thus the misfit strain energy controls the type of structure. The crossover thickness between the hillock and p-QDs regime is between 1.6 and 2.1 ML. The hillocks have larger lateral dimensions and volumes than p-QDs, and the p-QDs are exceptionally small quantum dots with a lower limit of 10nm in width. Our work opens a new pathway to the control of nanostructure morphology and size in the elastically strained Ge/Si system.