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首页> 外文期刊>Journal of Applied Physics >Effect of doping on the characteristics of infrared photodetectors based on van der Waals heterostructures with multiple graphene layers
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Effect of doping on the characteristics of infrared photodetectors based on van der Waals heterostructures with multiple graphene layers

机译:掺杂对具有多层石墨烯层的范德华异质结构的红外光电探测器特性的影响

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摘要

We study the operation of infrared photodetectors based on van der Waals heterostructures with multiple graphene layers (GLs) and n-type emitter and collector contacts. The operation of such GL infrared photodetectors (GLIPs) is associated with the photoassisted escape of electrons from the GLs into the continuum states in the conduction band of the barrier layers due to the interband photon absorption, the propagation of these electrons, and the electrons injected from the emitter across the heterostructure and their collection by the collector contact. The space charge of the holes trapped in the GLs provides a relatively strong injection and large photoelectric gain. We calculate the GLIP responsivity and dark current detectivity as functions of the energy of incident infrared photons and the structural parameters. It is shown that both the periodic selective doping of the inter-GL barrier layers and the GL doping lead to a pronounced variation of the GLIP spectral characteristics, particularly near the interband absorption threshold, while the doping of GLs solely results in a substantial increase in the GLIP detectivity. The doping "engineering" opens wide opportunities for the optimization of GLIPs for operation in different parts of the radiation spectrum from near infrared to terahertz.
机译:我们研究基于具有多个石墨烯层(GL)和n型发射极和集电极触点的范德华异质结构的红外光电探测器的操作。由于带间光子吸收,这些电子的传播和注入的电子,这种GL红外光电探测器(GLIP)的操作与电子从GL的光辅助逃逸到势垒层导带中的连续态有关从发射极跨过异质结构,并通过集电极接触将其收集。 GL中捕获的空穴的空间电荷提供了相对较强的注入和较大的光电增益。我们根据入射红外光子的能量和结构参数来计算GLIP响应度和暗电流检测度。结果表明,GL间势垒层的周期性选择性掺杂和GL掺杂都会导致GLIP光谱特性发生明显变化,特别是在带间吸收阈值附近,而GL的掺杂只会导致GLs的显着增加。 GLIP侦探性。掺杂“工程”为优化GLIP提供了广泛的机会,使其可以在从近红外到太赫兹的辐射光谱的不同部分进行操作。

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  • 来源
    《Journal of Applied Physics 》 |2017年第5期| 054505.1-054505.8| 共8页
  • 作者单位

    Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan,Institute of Ultra High Frequency Semiconductor Electronics of'RAS, Moscow 117105, Russia,Center for Photonics and Infrared Engineering, Bauman Moscow State Technical University, Moscow 111005, Russia;

    Department of Computer Science and Engineering, University of Aizu, Aizu-Wakamatsu 965-8580, Japan;

    Laboratory of 2D Materials' Optoelectronics, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russia;

    Department of Electrical Engineering, University at Buffalo, Buffalo, New York 1460-1920, USA;

    Department of Electrical, Computer, and Systems Engineering and Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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