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首页> 外文期刊>Journal of Applied Physics >Electrical properties of planar AIGaN/GaN Schottky diodes: Role of 2DEG and analysis of non-idealities
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Electrical properties of planar AIGaN/GaN Schottky diodes: Role of 2DEG and analysis of non-idealities

机译:平面AIGaN / GaN肖特基二极管的电学性质:2DEG的作用和非理想性分析

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摘要

A detailed study of the electrical properties of planar AIGaN/GaN Schottky diodes is presented, the focus being on the role of the two dimensional electron gas (2DEG) depletion and the diodes non-idealities in different voltage regimes. The 2DEG depletion behavior is inferred from the analysis of capacitance and current measurements with transition from vertical to lateral diode operation occurring at V_(Pinch-off)=4 V. particular, the sub-micrometer depletion width, lateralły extending from the edge of the Schottky contact under high reverse voltages, is evaluated on the basis of a simple fringe capacitance model. Current transport mechanisms are discussed, investigating the interrelation between 2DEG, Poole-Frenkel effect, and defects. With regard to defects, the role of dislocations in the AIGaN/GaN diode non-idealities, usually interpreted in terms of Schottky barrier inhomogeneities, is critically addressed. Photocurrent spatial mapping under high reverse voltage points out the not uniform electric field distribution around the Schottky contact and highlights the presence of local photo-conductive paths, likely associated with the dislocations near the edge of the Schottky contact.
机译:提出了对平面AIGaN / GaN肖特基二极管的电性能的详细研究,重点是二维电子气(2DEG)耗尽和二极管在不同电压状态下的非理想性的作用。 2DEG耗尽行为是根据对电容和电流测量的分析得出的,其中在V_(Pinch-off)= 4 V时发生了从垂直到横向二极管工作的过渡。特别是,亚微米耗尽宽度,从硅片的边缘横向扩展。基于简单的边缘电容模型,可以评估高反向电压下的肖特基接触。讨论了当前的传输机制,研究了2DEG,Poole-Frenkel效应和缺陷之间的相互关系。关于缺陷,关键解决了通常以肖特基势垒不均匀性来解释的AIGaN / GaN二极管非理想中位错的作用。高反向电压下的光电流空间映射指出了肖特基接触周围的电场分布不均匀,并突出显示了局部光电导路径的存在,可能与肖特基接触边缘附近的位错有关。

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  • 来源
    《Journal of Applied Physics 》 |2017年第13期| 135701.1-135701.7| 共7页
  • 作者单位

    IMM-CNR, Institute for Microelectronics and Microsystem, National Council of Research, Via Monteroni, 73100 Lecce, Italy;

    NANOTEC-CNR, Nanotechnology Institute, National Council of Research, Via Monteroni, 73100 Lecce, Italy;

    NANOTEC-CNR, Nanotechnology Institute, National Council of Research, Via Monteroni, 73100 Lecce, Italy;

    NANOTEC-CNR, Nanotechnology Institute, National Council of Research, Via Monteroni, 73100 Lecce, Italy;

    NANOTEC-CNR, Nanotechnology Institute, National Council of Research, Via Monteroni, 73100 Lecce, Italy;

    IMM-CNR, Institute for Microelectronics and Microsystem, National Council of Research, Via Monteroni, 73100 Lecce, Italy;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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