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Estimating complete band diagrams of non-ideal heterointerfaces by combining ellipsometry and photoemission spectroscopy

机译:结合椭圆偏振和光发射光谱法估计非理想异质界面的完整能带图

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摘要

In this work, we show that spectroscopic ellipsometry can he combined with photoemission spectroscopy to obtain complete interface band diagrams of non-ideal semiconductor heterointerfaces, such as interfaces between thin-film polycrystalline materials. The non-destructive ellipsometry measurement probes the near-interface bandgap of the two semiconductors (including the buried semiconductor) after the interface has formed. This is important in the non-ideal case where chemical processes during interface growth modify the electronic properties of the two separated surfaces. Knowledge of near-interface bandgaps improves accuracy in conduction band offset measurements of non-ideal interfaces, and it sheds light on their device physics. Both of those positive outcomes are demonstrated in the Cu2ZnSnS4/CdS interface used here as a case study, where the bandgap of both materials decreases by up to 200 meV from the bulk to the near-interface region. This finding reveals a preferential electron-hole recombination channel near the interface, and it yields corrected values for the interfacial conduction hand offset. Published by AIP Publishing.
机译:在这项工作中,我们证明了椭圆偏振光谱法可以与光发射光谱法结合以获得非理想的半导体异质界面(例如薄膜多晶材料之间的界面)的完整界面能带图。在界面形成后,无损椭圆偏振测量可探测两种半导体(包括埋入的半导体)的近界面带隙。这在非理想情况下非常重要,因为在这种情况下,界面生长过程中的化学过程会改变两个分开的表面的电子特性。接近界面带隙的知识提高了非理想界面的导带偏移测量的准确性,并阐明了它们的器件物理原理。这两个积极成果都在此处用作案例研究的Cu2ZnSnS4 / CdS界面中得到了证明,其中两种材料的带隙从本体到近界面区域最多降低了200 meV。该发现揭示了界面附近的优先的电子-空穴复合通道,并且它产生了界面传导手偏移的校正值。由AIP Publishing发布。

著录项

  • 来源
    《Journal of Applied Physics》 |2018年第8期|085302.1-085302.7|共7页
  • 作者

    Crovetto Andrea;

  • 作者单位

    Tech Univ Denmark, DTU Nanotech, DK-2800 Lyngby, Denmark;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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