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首页> 外文期刊>Journal of Applied Physics >High performance Ge_(0.89)Sn_(0.11) photodiodes for low-cost shortwave infrared imaging
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High performance Ge_(0.89)Sn_(0.11) photodiodes for low-cost shortwave infrared imaging

机译:用于低成本短波红外成像的高性能Ge_(0.89)Sn_(0.11)光电二极管

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摘要

Low-cost shortwave infrared detectors have great potential for emerging civilian night-vision applications. This paper reports the characteristics of Ge0.89Sn0.11 photodiodes monolithically grown on a Si substrate that holds great promise for those applications. At room temperature, the 500 mu m diameter active area device demonstrated a longwave cutoff of 2.65 mu m and a responsivity of 0.32 A/W at 2 mu m, which corresponds to an external quantum efficiency of 20% without any contribution from the Ge buffer layer. The measured peak specific detectivity at 300 K and 77 K is 1.7 x 10(9) Jones and 4.3 x 10(9) Jones, respectively. The specific detectivity at 77 K is only one-order-of- magnitude lower than that of the market dominating extended-InGaAs photodiode. The detailed device analysis indicated that the 700-nm thick fully relaxed high-quality GeSn absorbing layer and the modified depletion region lead to the above-mentioned device performance. Published by AIP Publishing.
机译:低成本短波红外探测器在新兴的民用夜视应用中具有巨大的潜力。本文报道了在硅衬底上单片生长的Ge0.89Sn0.11光电二极管的特性,这些应用前景广阔。在室温下,直径为500μm的有源区器件显示出2.65μm的长波截止和2μm时的响应度为0.32 A / W,这对应于20%的外部量子效率,而不受Ge缓冲剂的影响层。在300 K和77 K下测得的峰比探测度分别为1.7 x 10(9)Jones和4.3 x 10(9)Jones。在77 K时的比探测率仅比市场上扩展InGaAs光电二极管的市场低一个数量级。详细的器件分析表明,700 nm厚的完全弛豫的高质量GeSn吸收层和改进的耗尽区可导致上述器件性能。由AIP Publishing发布。

著录项

  • 来源
    《Journal of Applied Physics 》 |2018年第1期| 013101.1-013101.5| 共5页
  • 作者单位

    Univ Arkansas, Dept Elect Engn, Fayetteville, AR 72701 USA;

    Univ Arkansas, Dept Elect Engn, Fayetteville, AR 72701 USA;

    Wilkes Univ, Dept Elect Engn, Wilkes Barre, PA 18766 USA;

    Univ Arkansas, Dept Elect Engn, Fayetteville, AR 72701 USA;

    Univ Arkansas, Dept Elect Engn, Fayetteville, AR 72701 USA;

    Univ Arkansas, Dept Elect Engn, Fayetteville, AR 72701 USA;

    Univ Massachusetts, Dept Engn, Boston, MA 02125 USA;

    Univ Massachusetts, Dept Engn, Boston, MA 02125 USA;

    ASM, 3440 East Univ Dr, Phoenix, AZ 85034 USA;

    ASM, 3440 East Univ Dr, Phoenix, AZ 85034 USA;

    Univ Arkansas, Dept Chem & Phys, Pine Bluff, AR 71601 USA;

    Univ Arkansas, Dept Elect Engn, Fayetteville, AR 72701 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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