Laboratory based GIXRF and GEXRF spectrometers for multilayer structure investigations

摘要

This work reports laboratory angle resolved measurements with the goal of establishing laboratory techniques to obtain a more complete idea of the intralayer composition of multilayer samples. While X-ray reflectometry is a widely available technique for the characterization of multilayer samples, angle resolved XRF measurements (grazing emission/incidence X-ray fluorescence) are usually performed at synchrotron radiation facilities. With the development of efficient laboratory spectrometers and evaluation algorithms for angle resolved measurements, these methods become suited for routine measurements and screening. We present two laboratory spectrometers which make quantitative non-destructive elemental depth profiling feasible. For reasons of comparison a validation sample, a nickel-carbon multilayer sample, is measured with both setups and additional information on krypton contamination and its distribution is retrieved. Additionally, the first application for the characterization of multilayer structures with sub-nanometer layer thicknesses is shown.