...
首页> 外文期刊>Journal of Analytical Atomic Spectrometry >Theoretical calculations of the influence of resonant Raman scattering on the quantification of XRF spectrochemical analysis
【24h】

Theoretical calculations of the influence of resonant Raman scattering on the quantification of XRF spectrochemical analysis

机译:共振拉曼散射对XRF光谱化学分析定量影响的理论计算

获取原文
获取原文并翻译 | 示例
           

摘要

In this work we present theoretical calculations of the resonant Raman scattering contributions to the background of X-ray fluorescence spectra. The main goal of the paper is to obtain a simple and reliable procedure to calculate the influence of RRS in spectrochemical analysis by X-ray fluorescence including second order enhancement processes. In order to perform the calculations, the Shiraiwa and Fujino model was used to calculate the characteristic intensities of the different atomic processes involved. In the case of polychromatic excitation over a multi-element sample of proximate atomic numbers, the calculations show that the contribution of RRS is higher than Compton scattering but lower than coherent scattering, this last process being the most important source of background in the range of the fluorescent lines. The calculated effects of enhancements are rather low and have influence only on the lightest elements of the spectra. On the other hand, the resonant Raman scattering line interferes with fluorescent peaks in the case of monochromatic excitation when elements of proximate atomic numbers are analyzed (for example Al-Si). The model proposed here allows the analysis of the different sources of background, which contribute to a better understanding of the physical processes involved in the different techniques of XRF analysis. In addition, the calculations presented here can contribute significantly to a more precise quantification of traces and minor components.
机译:在这项工作中,我们介绍了共振拉曼散射对X射线荧光光谱背景的理论计算。本文的主要目的是获得一种简单可靠的方法,以计算包括二阶增强过程在内的X射线荧光光谱分析RRS在光谱化学分析中的影响。为了进行计算,使用了Shiraiwa和Fujino模型来计算所涉及的不同原子过程的特征强度。在多原子激发附近的多元素样品上进行多色激发的情况下,计算表明,RRS的贡献高于康普顿散射,但低于相干散射,这最后一个过程是背景光谱范围内最重要的背景源荧光线。计算出的增强效果相当低,仅影响光谱中最亮的元素。另一方面,在单色激发的情况下,当分析接近原子序数的元素(例如Al-Si)时,共振拉曼散射线会干扰荧光峰。这里提出的模型允许分析不同的背景源,这有助于更好地理解涉及XRF分析不同技术的物理过程。此外,此处介绍的计算可极大地有助于痕量和次要成分的更精确定量。

著录项

  • 来源
    《Journal of Analytical Atomic Spectrometry》 |2012年第2期|p.232-238|共7页
  • 作者单位

    Facultad de Matemdtica, Astronomia y Fisica, Universidad Nacional de Cordoba, 5000 Cordoba, Argentina;

    Facultad de Matemdtica, Astronomia y Fisica, Universidad Nacional de Cordoba, 5000 Cordoba, Argentina;

    Facultad de Matemdtica, Astronomia y Fisica, Universidad Nacional de Cordoba, 5000 Cordoba, Argentina;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号