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IR laser-induced process for chemical vapor deposition of polyselenocarbosilane films

机译:红外激光诱导的化学气相沉积聚硒碳硅烷薄膜的工艺

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摘要

TEA CO_2 laser irradiation into gaseous mixtures of 1,3-disilacyclobutane (DSCB) and dimethyl selenide (DMS) results in infrared multiple photon-induced, non-interacting homogeneous decompositions of both educts, one yielding silene (H_2Si = CH_2) and the other elemental selenium as major products. The reaction between polymerizing silene and agglomerizing Se leads to chemical vapor deposition of novel polyselenocarbosilane films which are unstable in atmosphere. The laser induced co-decomposition represents a new process in allowing (ⅰ) reaction between thermally generated transient and element and (ⅱ) chemical vapor deposition of the product of this reaction.
机译:将TEA CO_2激光照射到1,3-二硅环丁烷(DSCB)和二甲基硒化物(DMS)的气体混合物中时,两种离析物在红外光的作用下均发生多光子诱导的非相互作用均质分解,一种生成硅(H_2Si = CH_2),另一种生成元素硒为主要产品。聚合的硅烷与团聚的Se之间的反应导致在大气中不稳定的新型聚硒碳硅烷薄膜的化学气相沉积。激光诱导的共分解代表了一种新的过程,可以使热生成的瞬态和元素之间发生(ⅰ)反应,并使该反应的产物发生化学气相沉积。

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