Structural and mechanical investigations of magnetron sputtering TiO/Ti/TiN multilayer films on Si(100) substrate

摘要

TiO_2/Ti/TiN multicompositional coating was prepared by DC reactive magnetron sputtering (MS) at a temperature of 150℃ using a combination of a Ti metal target and a pure Ar, an Ar-O_2 mixture, or an Ar-N_2 mixture discharge gas, onto a Silicon(lOO) substrate. This system represents nano-structured multilayer substrate model for biomedical application as well as substrate models to reproduce the bulk titanium surface. This substrate model (Ti/TiN/Si(100)) makes possible and easy mechanical and microscopic characterization in particular for transmission electron microscopy after biocompatible test. The model multilayer TiO_2/Ti/TiN/(100) was obtained after preparation of two intermediate samples: TiN/Si(100) and Ti/TiN/ Si(100). Structural (X-ray diffraction), morphological (scanning electron and atomic force microscopy) as well as mechanical (hardness and elastic modulus) studies of the MS films were performed.