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首页> 外文期刊>Japanese journal of applied physics >Lateral ellipsometry resolution for imaging ellipsometry measurement
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Lateral ellipsometry resolution for imaging ellipsometry measurement

机译:用于成像椭圆测量测量的横向椭圆分辨率

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摘要

As an approach to integrate both single-point measurement ellipsometry and optical microscopy, imaging ellipsometry possesses the capability of measurement of distributions of optical constants and/or thickness of sample surfaces. Considering the exact distinguishment of neighboring surfaces from imaging ellipsometry measurement, in this note, we propose to use a new criterion for the lateral ellipsometry resolution: about 2.23 fold of the Abbe diffraction limit for a microscope. This criterion will be helpful for the estimation of the applicability of an imaging ellipsometer into the evaluation of micro-patterned surfaces.
机译:作为整合单点测量椭圆形测量和光学显微镜的方法,成像椭圆测定法具有测量光学常数和/或样品表面厚度的能力。 考虑到相邻表面从成像椭圆测量测量的确切区别,在本说明中,我们建议使用横向椭圆形分辨率的新标准:显微镜的ABBE衍射极限约为2.23倍。 该标准将有助于估计成像椭圆仪的适用性进入微图案化表面的评估。

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