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Direct imaging method of frequency response of capacitance in dual bias modulation electrostatic force microscopy

机译:双偏置调制静电力显微镜中电容频率响应的直接成像方法

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摘要

We have proposed and demonstrated a direct imaging method in dual bias modulation electrostatic force microscopy (DI-DEFM) to observe the frequency response of the capacitance between a conductive tip and a sample in a single scan. In DI-DEFM, dual ac biases with different frequencies (f(1), f(2)) are simultaneously applied between the tip and the sample to generate an electrostatic force; the frequencies are switched between two pairs of frequency conditions, with a switching frequency f(m). Then, the f(2) - 2f(1) - f(m) component in the electrostatic force is detected, similar to a heterodyne method, to analyze the frequency response of the capacitance. The validity of DI-DEFM is assessed through the image acquisition on a Cu(In,Ga)Se-2 sample. (C) 2020 The Japan Society of Applied Physics
机译:我们已经提出并展示了双偏压调制静电力显微镜(Di-Defm)的直接成像方法,以观察在单个扫描中导电尖端和样品之间的电容的频率响应。在DI-DEFM中,具有不同频率的双交流偏置(F(1),F(2))同时施加在尖端和样品之间以产生静电力;频率在两对频率条件之间切换,具有开关频率f(m)。然后,检测静电力中的F(2) - 2F(1)-F(M)分量,类似于外差法,以分析电容的频率响应。通过Cu(In,Ga)Se-2样品上的图像采集评估Di-Defm的有效性。 (c)2020日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2020年第7期|078001.1-078001.4|共4页
  • 作者单位

    Univ Tokyo Inst Ind Sci Meguro Ku Tokyo 1538505 Japan;

    Univ Tokyo Inst Ind Sci Meguro Ku Tokyo 1538505 Japan|Univ Tokyo Inst Nano Quantum Informat Elect Meguro Ku Tokyo 1538505 Japan;

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