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首页> 外文期刊>Japanese journal of applied physics >Round-robin test of the photoluminescence method after electron irradiation for quantifying low-level carbon in silicon
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Round-robin test of the photoluminescence method after electron irradiation for quantifying low-level carbon in silicon

机译:电子照射后光致发光法测量硅中的低级碳的循环试验

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Round-robin test of the photoluminescence method after electron irradiation was performed for quantifying low-level C impurities in the magnetic-field-applied Czochralski Si crystals with a resistivity of about 50 k Omega.cm (n-type) and with resistivity higher than 5 k Omega.cm (p-type). Their C concentrations were determined as ranging from 1.4 x 10(14) to 3.6 x 10(15) cm(-3) by secondary ion mass spectroscopy. A universal correlation holds between the C concentration and the intensity ratio of the G-line to the band-edge emission normalized by the ratio of the reference sample, which can be used as a calibration curve for the C quantification. The measurement error and repeatability of the G-line intensity ratio are less than +/- 20% and less than +/- 10% deviation, respectively, and the overall error in the C concentration estimated from the calibration curve is less than +/- 30%. This demonstrates the effectiveness of the present method as a novel standard technique for quantifying low-level C impurities. (C) 2020 The Japan Society of Applied Physics
机译:进行电子照射后的光致发光方法的循环罗宾试验用于定量磁场施加的Czochralski Si晶体中的低水平C杂质,其电阻率为约50kΩcm(n型),电阻率高于5 k omega.cm(p型)。通过二次离子质谱法测定其C浓度为1.4×10(14)至3.6×10(-3)。通过参考样品的比率将G-LINE与带边发射的C浓度和强度比之间的通用相关性保持在C浓度和带边的发射之间,这可以用作C量化的校准曲线。 G线强度比的测量误差和重复性分别小于+/- 20%且小于+/- 10%偏差,并且从校准曲线估计的C浓度中的总误差小于+ / - 30%。这证明了本发明方法作为量化低水平C杂质的新型标准技术的有效性。 (c)2020日本应用物理学会

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  • 来源
    《Japanese journal of applied physics 》 |2020年第sg期| SGGK05.1-SGGK05.5| 共5页
  • 作者单位

    Japan Soc Newer Met Tokyo 1050011 Japan|Inst Space & Astronaut Sci JAXA Sagamihara Kanagawa 2525210 Japan|Meiji Univ Kawasaki Kanagawa 2148571 Japan;

    Japan Soc Newer Met Tokyo 1050011 Japan|SUMCO CORP Imari 8494256 Japan;

    Japan Soc Newer Met Tokyo 1050011 Japan|GlobalWafers Japan Co Ltd Tokyo 1410032 Japan;

    Japan Soc Newer Met Tokyo 1050011 Japan;

    Japan Soc Newer Met Tokyo 1050011 Japan|Mizuho Informat & Res Inst Inc Tokyo 1018443 Japan;

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