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首页> 外文期刊>Japanese journal of applied physics >Effects of boron and hydrogen doping on the enhancement of photoresponsivity and photoluminescence of BaSi_2 epitaxial films
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Effects of boron and hydrogen doping on the enhancement of photoresponsivity and photoluminescence of BaSi_2 epitaxial films

机译:硼和氢气掺杂对Basi_2外延薄膜光致发光和光致发光的影响

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摘要

BaSi2 is an emerging material for solar cell applications. We investigate the defect properties of 0.5 mu m thick BaSi2 films by photoresponse and photoluminescence (PL) measurements. The photoresponsivity of BaSi2 films measured under a bias voltage of 0.3 V applied between the front-surface and rear-surface electrodes at room temperature was enhanced by doping B atoms of the order of 10(18) cm(-3). Much further enhancement was achieved after atomic H supply for 5 min by a RF plasma gun. These results suggest that the doping of B and H atoms is an effective means to passivate the defects in BaSi2 films. PL measurements at 8-9 K highlighted the existence of localized states within the bandgap. Measured PL spectra were decomposed into two or four Gaussian curves. The enhancement of photoresponsivity was ascribed to the decrease of deep defect levels. (c) 2020 The Japan Society of Applied Physics
机译:Basi2是太阳能电池应用的新出现材料。我们通过光响应和光致发光(PL)测量来研究0.5μm厚Basi2膜的缺陷性能。通过掺杂为10(18 )cm(-3)的B原子,增强了在室温下施加在室温的0.3V的偏置电压下的Basi2膜的光响应性。通过RF等离子体枪在原子H供应5分钟后实现了很多进一步的增强。这些结果表明B和H原子的掺杂是将缺陷钝化Basi2薄膜的有效手段。 PL测量为8-9 k突出显示带隙内的局部状态。测量的Pl光谱分解成两个或四个高斯曲线。对光反应性的增强归因于深度缺陷水平的降低。 (c)2020日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2020年第sf期|SFFA08.1-SFFA08.5|共5页
  • 作者单位

    Univ Tsukuba Tsukuba Ibaraki 3058577 Japan|Univ Grenoble Alpes F-38400 St Martin Dheres France;

    Univ Tsukuba Tsukuba Ibaraki 3058577 Japan;

    Univ Tsukuba Tsukuba Ibaraki 3058577 Japan;

    Univ Tsukuba Tsukuba Ibaraki 3058577 Japan|Univ Grenoble Alpes F-38400 St Martin Dheres France;

    Univ Tsukuba Tsukuba Ibaraki 3058577 Japan;

    Univ Tsukuba Tsukuba Ibaraki 3058577 Japan;

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