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首页> 外文期刊>Japanese journal of applied physics >Sulfurization of Cu_2(Sn,Ge)S_3 thin films deposited by co-evaporation
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Sulfurization of Cu_2(Sn,Ge)S_3 thin films deposited by co-evaporation

机译:Cu_2(Sn,Ge)S_3薄膜通过共蒸发硫化

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摘要

The sulfurization effect of Cu-2(Sn1-x,Ge-x)S-3 (CTGS) thin films deposited by low-temperature co-evaporation was investigated. As-deposited CTGS films with large Cu2GeS3 molar fractions show poor crystal quality and contamination with extra phases. After sulfurization using sulfur powder, the full width at half-maximum of X-ray diffraction peaks for CTGS films was smaller than that of the as-deposited CTGS films. Moreover, contamination of the extra phases was not observed in the sulfurized CTGS film. These results imply that single-phase thin-film CTGS is difficult to obtain by only low-temperature co-evaporation. Therefore, sulfurization is necessary to suppress extra phases and obtain single-phase CTGS films. (C) 2019 The Japan Society of Applied Physics
机译:研究了通过低温共蒸发沉积的Cu-2(SN1-X,Ge-X)S-3(CTGS)薄膜的硫化效果。具有大Cu2Ges3摩尔级分的沉积CTGS薄膜显示出差的晶体质量和额外阶段的污染。使用硫粉末硫化后,用于CTGS膜的半最大X射线衍射峰的全宽度小于沉积的CTGS薄膜的X射线衍射峰。此外,在硫化CTGS膜中未观察到额外阶段的污染。这些结果意味着仅通过低温共蒸发获得单相薄膜CTG。因此,硫化是抑制额外阶段的必需阶段并获得单相CTGS薄膜。 (c)2019年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics 》 |2020年第sc期| SCCD01.1-SCCD01.4| 共4页
  • 作者单位

    Tokyo Univ Sci Fac Sci & Technol 2641 Yamazaki Noda Chiba 2788510 Japan;

    Nagaoka Coll Natl Inst Technol 888 Nishikatakai Nagaoka Niigata 9408532 Japan;

    Nagaoka Coll Natl Inst Technol 888 Nishikatakai Nagaoka Niigata 9408532 Japan;

    Tokyo Univ Sci Fac Sci & Technol 2641 Yamazaki Noda Chiba 2788510 Japan;

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