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首页> 外文期刊>Japanese journal of applied physics >A review on the latest progress of visible GaN-based VCSELs with lateral confinement by curved dielectric DBR reflector and boron ion implantation
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A review on the latest progress of visible GaN-based VCSELs with lateral confinement by curved dielectric DBR reflector and boron ion implantation

机译:曲线介质DBR反射器与硼离子植入横向约束的可见GaN基VCSELS的最新进展综述

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摘要

This review introduces the latest progress on gallium nitride (GaN)-based visible vertical-cavity surface-emitting lasers (VCSELs) with features such as plane and curved distributed Bragg reflectors (DBRs) made of dielectric materials and boron ion implantation to form current apertures. This novel class of GaN-based VCSELs allow small apertures down to 3 mu m and long cavities of more than 20 mu m without the occurrence of diffraction loss. These structures have enabled low threshold currents (e. g., I-th = 0.25 mA), high efficiency operation (e. g., WPE = 9.5%), and robust fabrication processes with high lasing yield. All those characteristics are the best among those previously reported GaN-based VCSELs. The proposed structure should facilitate the production of VCSELs formed on semi-polar plane GaN substrates and arrayed VCSELs, which are expected to realize novel light emitters that have been previously difficult to fabricate, such as green VCSELs and watt-class blue VCSEL arrays. (C) 2019 The Japan Society of Applied Physics
机译:本综述介绍了基于氮化镓(GaN)的可见垂直腔表面发射激光器(VCSEL)的最新进展,其中具有由介电材料和硼离子注入制成的平面和弯曲分布式布拉格反射器(DBRS),以形成电流孔。这种新型的基于GaN的VCSELS允许小孔径到3μm和长腔的长度超过20μm,而不会发生衍射损失。这些结构使得能够使低阈值电流(例如,i-Th = 0.25 mA),高效率操作(例如,WPE,WPE = 9.5%)和具有高激光率高的鲁棒制造过程。所有这些特征都是先前报告的基于GaN的VCSEL中的最佳状态。所提出的结构应促进在半极性平面GaN基板上形成的VCSEL,并预期实现先前难以制造的新型光发射器,例如绿色VCSEL和WATT-Class蓝色VCSEL阵列。 (c)2019年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第sc期|SC0806.1-SC0806.18|共18页
  • 作者单位

    Sony Corp Compound Semicond Dev Dept 4-14-1 Atsugi Atsugi Kanagawa Japan;

    Sony Corp Compound Semicond Dev Dept 4-14-1 Atsugi Atsugi Kanagawa Japan;

    Sony Corp Compound Semicond Dev Dept 4-14-1 Atsugi Atsugi Kanagawa Japan;

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