...
首页> 外文期刊>Japanese journal of applied physics >A review on the latest progress of visible GaN-based VCSELs with lateral confinement by curved dielectric DBR reflector and boron ion implantation
【24h】

A review on the latest progress of visible GaN-based VCSELs with lateral confinement by curved dielectric DBR reflector and boron ion implantation

机译:弯曲电介质DBR反射器和硼离子注入对横向限制的可见GaN基VCSEL的最新进展的综述

获取原文
获取原文并翻译 | 示例

摘要

This review introduces the latest progress on gallium nitride (GaN)-based visible vertical-cavity surface-emitting lasers (VCSELs) with features such as plane and curved distributed Bragg reflectors (DBRs) made of dielectric materials and boron ion implantation to form current apertures. This novel class of GaN-based VCSELs allow small apertures down to 3 mu m and long cavities of more than 20 mu m without the occurrence of diffraction loss. These structures have enabled low threshold currents (e. g., I-th = 0.25 mA), high efficiency operation (e. g., WPE = 9.5%), and robust fabrication processes with high lasing yield. All those characteristics are the best among those previously reported GaN-based VCSELs. The proposed structure should facilitate the production of VCSELs formed on semi-polar plane GaN substrates and arrayed VCSELs, which are expected to realize novel light emitters that have been previously difficult to fabricate, such as green VCSELs and watt-class blue VCSEL arrays. (C) 2019 The Japan Society of Applied Physics
机译:这篇评论介绍了基于氮化镓(GaN)的可见垂直腔表面发射激光器(VCSEL)的最新进展,该激光器具有诸如由介电材料制成的平面和弯曲分布布拉格反射器(DBR)以及硼离子注入以形成电流孔的功能。这类新型的基于GaN的VCSEL允许小至3μm的小孔径和大于20μm的长腔,而不会发生衍射损耗。这些结构使得能够实现低阈值电流(例如,Ith = 0.25mA),高效率操作(例如,WPE = 9.5%)以及具有高激光产率的坚固的制造工艺。在先前报道的基于GaN的VCSEL中,所有这些特性都是最好的。拟议的结构应有助于在半极性平面GaN衬底和阵列VCSEL上形成的VCSEL的生产,这些VCSEL有望实现以前难以制造的新型发光体,例如绿色VCSEL和瓦特级蓝色VCSEL阵列。 (C)2019日本应用物理学会

著录项

  • 来源
    《Japanese journal of applied physics》 |2019年第sc期|SC0806.1-SC0806.18|共18页
  • 作者单位

    Sony Corp, Compound Semicond Dev Dept, 4-14-1 Atsugi, Atsugi, Kanagawa, Japan;

    Sony Corp, Compound Semicond Dev Dept, 4-14-1 Atsugi, Atsugi, Kanagawa, Japan;

    Sony Corp, Compound Semicond Dev Dept, 4-14-1 Atsugi, Atsugi, Kanagawa, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号