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Constriction of a lattice constant in an epitaxial magnesium oxide film deposited on a silicon substrate

机译:沉积在硅衬底上的外延氧化镁膜中晶格常数的收缩

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We demonstrated epitaxial growth of magnesium oxide (MgO) on a silicon (Si) substrate with cubic on cubic structure (MgO(001)//Si(001) and MgO(100)//Si(100)]. Epitaxial films were prepared using the pulsed laser deposition method, and with dependent on deposition conditions of oxygen partial pressure and substrate temperature, the lattice constants of MgO decreased along both the surface normal and in-plane directions. To support the facts of (1) constriction of lattice constants and (2) cubic on cubic growth, we show (1) optimal lattice constants with defects in the crystal structure, (2) domain mismatch between MgO and Si instead of lattice mismatch, and (3) stability of MgO crystals on the surface of the Si substrate. (C) 2018 The Japan Society of Applied Physics
机译:我们证明了氧化镁(MgO)在具有立方立方结构(MgO(001)// Si(001)和MgO(100)// Si(100)]的硅(Si)衬底上的外延生长。使用脉冲激光沉积法,并根据氧分压和衬底温度的沉积条件,MgO的晶格常数沿表面法线和平面方向均减小,以支持以下事实:(1)收缩晶格常数(2)立方晶立方生长,我们显示(1)具有晶体结构缺陷的最佳晶格常数,(2)MgO和Si之间的畴失配而不是晶格失配,以及(3)MgO晶体在硅表面上的稳定性(Si)(C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第sa期|SAAD06.1-SAAD06.4|共4页
  • 作者单位

    Kanagawa Inst Ind Sci & Technol KISTEC, Ebina, Kanagawa 2430435, Japan|Sagamihara Surface Lab, Sagamihara, Kanagawa 2520243, Japan|Tokyo Inst Technol, Yokohama, Kanagawa 2268502, Japan;

    Tohoku Univ, Sendai, Miyagi 9808577, Japan;

    Tohoku Univ, Sendai, Miyagi 9808577, Japan;

    Tohoku Univ, Sendai, Miyagi 9808577, Japan;

    Tohoku Univ, Sendai, Miyagi 9808577, Japan;

    Kanagawa Inst Ind Sci & Technol KISTEC, Ebina, Kanagawa 2430435, Japan;

    Kanagawa Inst Ind Sci & Technol KISTEC, Ebina, Kanagawa 2430435, Japan;

    Istanbul Univ, TR-34134 Istanbul, Turkey;

    Sabanci Univ, TR-34956 Istanbul, Turkey;

    Sagamihara Surface Lab, Sagamihara, Kanagawa 2520243, Japan;

    Sagamihara Surface Lab, Sagamihara, Kanagawa 2520243, Japan|Japan Adv Chem, Sagamihara, Kanagawa 2520243, Japan;

    Japan Adv Chem, Sagamihara, Kanagawa 2520243, Japan;

    Tokyo Inst Technol, Yokohama, Kanagawa 2268502, Japan;

    Tokyo Inst Technol, Yokohama, Kanagawa 2268502, Japan;

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