Electrodeposition of Diamond-like Carbon Films on Silicon Substrates Using N,N-Dimethylformamid

摘要

Diamond-like carbon (DLC) films were synthesized by an electrodeposition technique on silicon (Si) substrates using liquid N,N-dimethylformamid (DMF). The electrodeposition was performed in the temperature range from 40 to 80℃ and the applied voltage range from -1 kV to -5 kV. The structures of the films were characterized by Raman spectroscopy. The films with the electrical resistivity of about 10~(10) Ω·cm can be deposited using the liquid DMF under the liquid temperature of 80℃ and the applied voltage of -2 kV. Moreover, the current density has an important role in the deposition of the films.