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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Enhanced Carrier Densities in Indium Tin Oxide Films Covered with Nanoparticles of Fluorine-Doped Tin Oxide for Transparent Conducting Electrodes
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Enhanced Carrier Densities in Indium Tin Oxide Films Covered with Nanoparticles of Fluorine-Doped Tin Oxide for Transparent Conducting Electrodes

机译:透明导电电极上掺纳米氟掺杂氧化锡颗粒覆盖的氧化铟锡薄膜中载流子密度的提高

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摘要

The carrier density and Hall mobility of indium tin oxide (ITO) films uniformly deposited with single layers of monodispersive nanoparticles of fluorine-doped tin oxide (FTO) show intriguing variations as functions of the average size of FTO particles (D_(av)). For D_(av)s smaller than about 10 nm, the bilayer has conduction-electron densities lower than bare ITO films, accompanied by increased Hall mobilities. Surprisingly, for D_(av)s of a few tens of nanometers, the carrier density in the bilayer is higher by at least 30% than that of bare ITO films. A classical double-Schottky band model of an n-n isotype heterojunction can account for these behaviors. This model assumes high-density local states at the ITO-film/FTO-nanoparticle interface, which trap conduction electrons, while FTO nanoparticles act as electron injectors. It is pointed out that the ability to control the optoelectronic properties simply by optimizing the film structure is useful in applications to practical transparent conducting electrodes.
机译:均匀掺有氟掺杂氧化锡(FTO)单分散纳米颗粒单层的铟锡氧化物(ITO)膜的载流子密度和霍尔迁移率显示出令人感兴趣的变化,这些变化是FTO颗粒平均尺寸(D_(av))的函数。对于小于约10nm的D_(av),双层具有比裸ITO膜低的传导电子密度,同时具有增加的霍尔迁移率。令人惊讶地,对于几十纳米的D_(av),双层中的载流子密度比裸ITO膜的载流子密度高至少30%。 n-n同型异质结的经典双肖特基带模型可以解释这些行为。该模型假设在ITO膜/ FTO纳米颗粒界面处存在高密度局部状态,该状态会捕获导电电子,而FTO纳米颗粒则充当电子注入器。应当指出,简单地通过优化膜结构来控制光电性能的能力在实际的透明导电电极中有用。

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