首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >High-Speed Fabrication of Super-Resolution Near-Field Structure Read-Only Memory Master Disc using PtO_x Thermal Decomposition Lithography
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High-Speed Fabrication of Super-Resolution Near-Field Structure Read-Only Memory Master Disc using PtO_x Thermal Decomposition Lithography

机译:使用PtO_x热分解光刻技术高速制作超分辨率近场结构只读存储器母盘

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摘要

We propose a new lithography technique using thermal decomposition of platinum oxide (PtO_x) for high-throughput master disc fabrication. The smallest pit size was evaluated to be 50 nm using a laser wavelength of 405 nm and a numerical aperture (NA) of 0.65; hence, it is one-twelfth the optical spot size. In addition, fabrication of pits with different shapes was examined, and its effects on super-resolution near-field structure (super-RENS) disc properties were studied. The readout signal characteristic evaluated on the basis of carrier-to-noise ratio (CNR) with an elliptical pit was 7 dB larger than that of the round one. The results demonstrated that this high-throughput fabrication technique is also useful for controling the pit shape for CNR improvement of super-resolution readout.
机译:我们提出了一种新的光刻技术,该技术使用氧化铂(PtO_x)的热分解来制造高通量母盘。使用405 nm的激光波长和0.65的数值孔径(NA)将最小凹坑尺寸评估为50 nm;因此,它是光斑尺寸的十二分之一。另外,研究了具有不同形状的凹坑的制造,并研究了其对超分辨率近场结构(super-RENS)光盘性能的影响。根据具有椭圆凹坑的载波噪声比(CNR)评估的读出信号特性比第一轮大7 dB。结果表明,这种高通量制造技术还可用于控制凹坑形状,从而改善超分辨率读数的CNR。

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