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首页> 外文期刊>Japanese journal of applied physics >Microstructural and Optical Properties of Semiconducting MnSi_(1.7) Synthesized by Ion Implantation
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Microstructural and Optical Properties of Semiconducting MnSi_(1.7) Synthesized by Ion Implantation

机译:离子注入合成的MnSi_(1.7)半导体的微观结构和光学性质

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摘要

Semiconducting high manganese silicide (HMS) MnSi_(1.7) precipitates and thin films have been synthesized by ion implantation. High-resolution transmission electron microscopy (HRTEM) was employed to investigate the crystalline structures. The equilibrium phase of MnSi_(1.7), i.e., Mn_4Si_7, was synthesized in all samples. Optical absorption spectra obtained by transmission measurements demonstrated the existence of a direct band gap in all samples. The band gap energies varied ranging from 0.77 to 0.93 eV, possibly due to variation in the strain state associated with different microstructures.
机译:半导体高锰硅化物(HMS)MnSi_(1.7)沉淀物已经通过离子注入合成了薄膜。高分辨率透射电子显微镜(HRTEM)用于研究晶体结构。在所有样品中合成了MnSi_(1.7)的平衡相,即Mn_4Si_7。通过透射测量获得的光吸收光谱证明在所有样品中都存在直接带隙。带隙能在0.77至0.93 eV范围内变化,这可能是由于与不同微结构相关的应变状态的变化。

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