首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Improvement in On/Off Ratio of Pentacene Static Induction Transistors by Controlling Hole Injection Barrier
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Improvement in On/Off Ratio of Pentacene Static Induction Transistors by Controlling Hole Injection Barrier

机译:通过控制空穴注入势垒改善并五苯静电感应晶体管的开/关比

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摘要

For the realization of high-performance organic static induction transistors (OSITs), it is important to investigate the effect of a hole injection barrier at the interface between a pentacene films and a source electrode in OSITs. In this study, the OSITs based on pentacene films were fabricated on various metallic source electrodes with different work functions and on copper phthalocyanine (CuPc)/indium tin oxide (ITO) electrodes with different CuPc thicknesses. The hole injection barrier was affected by the work function of metallic source electrodes (ITO, Au, and Pt) and the thickness of CuPc (0, 3, and 5 nm). The obtained results demonstrate that a high on/off ratio is achieved when a hole injection barrier with a moderate height is formed at the interface. It was found that controlling the hole injection barrier is effective for improving the characteristics of OSITs.
机译:为了实现高性能有机静电感应晶体管(OSIT),重要的是研究在OSIT中并五苯薄膜与源电极之间的界面处的空穴注入势垒的影响。在这项研究中,基于并五苯薄膜的OSITs在具有不同功函数的各种金属源电极上以及在具有不同CuPc厚度的铜酞菁(CuPc)/铟锡氧化物(ITO)电极上制造。空穴注入势垒受金属源电极(ITO,Au和Pt)的功函数以及CuPc的厚度(0、3和5 nm)的影响。所获得的结果表明,当在界面处形成具有中等高度的空穴注入势垒时,可以获得高的开/关比。发现控制空穴注入势垒对于改善OSIT的特性是有效的。

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