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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Growth and Optical Properties of (KNa)_(0.1)(Sr_(0.61)Ba_(0.39))_(0.9)Nb_2O_6 Thin Films by Pulsed Laser Deposition
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Growth and Optical Properties of (KNa)_(0.1)(Sr_(0.61)Ba_(0.39))_(0.9)Nb_2O_6 Thin Films by Pulsed Laser Deposition

机译:脉冲激光沉积(KNa)_(0.1)(Sr_(0.61)Ba_(0.39))_(0.9)Nb_2O_6薄膜的生长和光学性质

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摘要

Epitaxial (KNa)_(0.1)Sr_(0.61)Ba_(0.39))_(0.9)Nb_2O_6 (KNSBN:61) thin films deposited on MgO(100) substrates have been prepared by pulsed laser deposition (PLD). The structural properties of the thin films have been examined by X-ray diffraction analysis. An X-ray diffraction 2θ scan indicates single crystalline layers with the (001) orientation perpendicular to the substrate plane. The optical transmission spectra of the thin films have been obtained in the spectral range of 200-900nm, and their optical constants (refractive index n and extinction coefficient k) have been determined. It has been found that the refractive index of the thin films is similar to that of a KNSBN:61 single bulk crystal. The birefringent shift as a function of the applied voltage of the thin films on fused silica has been measured, and the quadratic electro optic coefficient R has been derived to be 0.4 x 10~(-16)(m/V)~2 at 6328A.
机译:已经通过脉冲激光沉积(PLD)制备了沉积在MgO(100)衬底上的外延(KNa)_(0.1)Sr_(0.61)Ba_(0.39)_(0.9)Nb_2O_6(KNSBN:61)薄膜。通过X射线衍射分析检查了薄膜的结构性能。 X射线衍射2θ扫描表明(001)取向垂直于基板平面的单晶层。已经获得了在200-900nm的光谱范围内的薄膜的光透射光谱,并且已经确定了它们的光学常数(折射率n和消光系数k)。已经发现,薄膜的折射率类似于KNSBN:61单块晶体的折射率。测量了双折射位移与薄膜在熔融石英上施加电压的关系,在6328A时二次电光学系数R推导为0.4 x 10〜(-16)(m / V)〜2 。

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