首页> 外文期刊>Japanese journal of applied physics >Optical Output Power Enhancement of Gallium Nitride Light-Emitting Diodes with Microlens Array on p-GaN Layer and Wave-Patterned Sidewalls by Gas-Assisted Focused Ion Beam Etching
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Optical Output Power Enhancement of Gallium Nitride Light-Emitting Diodes with Microlens Array on p-GaN Layer and Wave-Patterned Sidewalls by Gas-Assisted Focused Ion Beam Etching

机译:气体辅助聚焦离子束刻蚀增强p-GaN层和波状侧壁上具有微透镜阵列的氮化镓发光二极管的光输出功率

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摘要

By using iodine gas-assisted focused ion beam etching, a gallium nitride light-emitting diode with wave-patterned sidewalls and a microlens array on a p-GaN layer was successfully fabricated without an additional lithography process. The gallium nitride l
机译:通过使用碘气辅助聚焦离子束刻蚀,无需额外的光刻工艺即可成功地在p-GaN层上制造出具有波状侧壁和微透镜阵列的氮化镓发光二极管。氮化镓l

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