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Lateral Back-to-Back Diode for Low-Capacitance Transient Voltage Suppressor

机译:用于低电容瞬态电压抑制器的横向背对背二极管

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摘要

In this paper, a transient voltage suppressor (TVS) using a native lateral back-to-back diode structure in conventional complementary metal-oxide-semiconductor (CMOS) technology is proposed. The capacitance, direct-current (DC) current-voltage (Ⅰ-Ⅴ) characteristics, and transmission line pulse (TLP) Ⅰ-Ⅴ characteristics of this lateral back-to-back diode are investigated. An optimization guideline for the lateral device is presented. The lateral structure is also suitable for the advanced wafer-level chip-scale package (WL-CSP) technology to meet the low capacitance and small footprint requirement for high-frequency or handheld device applications. This is a simple solution for a low-capacitance and low breakdown-voltage protection device against electrostatic discharge and electrical overstress in discrete or on-chip applications.
机译:本文提出了一种在传统互补金属氧化物半导体(CMOS)技术中使用本机横向背对背二极管结构的瞬态电压抑制器(TVS)。研究了这种横向背对背二极管的电容,直流(DC)电流-电压(Ⅰ-Ⅴ)特性和传输线脉冲(TLP)Ⅰ-Ⅴ特性。提出了横向设备的优化指南。横向结构也适用于先进的晶圆级芯片级封装(WL-CSP)技术,以满足高频或手持设备应用的低电容和小占位面积要求。这是一种针对低电容和低击穿电压保护器件的简单解决方案,该器件可防止分立或芯片应用中的静电放电和电气过应力。

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  • 来源
    《Japanese journal of applied physics》 |2010年第4issue2期|P.04DP13.1-04DP13.4|共4页
  • 作者单位

    Microelectronics Laboratory, Semiconductor Technology Application Research (STAR) Group, Institute of Electronics Engineering, National Tsing-Hua University, Hsinchu 30013, Taiwan;

    rnMicroelectronics Laboratory, Semiconductor Technology Application Research (STAR) Group, Institute of Electronics Engineering, National Tsing-Hua University, Hsinchu 30013, Taiwan;

    rnMicroelectronics Laboratory, Semiconductor Technology Application Research (STAR) Group, Institute of Electronics Engineering, National Tsing-Hua University, Hsinchu 30013, Taiwan;

    rnMicroelectronics Laboratory, Semiconductor Technology Application Research (STAR) Group, Institute of Electronics Engineering, National Tsing-Hua University, Hsinchu 30013, Taiwan;

    rnMicroelectronics Laboratory, Semiconductor Technology Application Research (STAR) Group, Institute of Electronics Engineering, National Tsing-Hua University, Hsinchu 30013, Taiwan;

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