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首页> 外文期刊>Japanese journal of applied physics >Temperature Dependence of the Resistance of AlGaN/GaN Heterostructures and Their Applications as Temperature Sensors
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Temperature Dependence of the Resistance of AlGaN/GaN Heterostructures and Their Applications as Temperature Sensors

机译:AlGaN / GaN异质结构电阻的温度依赖性及其在温度传感器中的应用

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摘要

AlGaN/GaN heterostructures with a two-dimensional electron gas (2DEG) exhibit unique transport properties that could potentially be used for novel applications that are not related to conventional modulation-doped field effect transistor devices. Here, we describe the fabrication of high sensitivity temperature sensors exploiting temperature induced resistance changes of AlGaN/GaN-2DEG heterostructures. We observed a monotonous change in the resistance of the 2DEG from 3 to 1000K. The temperature dependence of the resistance above 180K fitted the Callender-Van Dusen equation. The sensitivity of the AlGaN/GaN temperature sensors was more than 2 times higher than conventional resistance temperature detectors near room temperature and 5 times higher at about 900 K. These new AlGaN/GaN temperature sensors may find niche applications in extreme environments, such as space exploration, as well as where high sensitivity is required over wide temperature ranges.
机译:具有二维电子气(2DEG)的AlGaN / GaN异质结构具有独特的传输特性,可潜在地用于与常规调制掺杂的场效应晶体管器件无关的新型应用。在这里,我们描述了利用温度引起的AlGaN / GaN-2DEG异质结构电阻变化的高灵敏度温度传感器的制造。我们观察到了2DEG电阻从3到1000K的单调变化。高于180K的电阻的温度依赖性符合Callender-Van Dusen方程。 AlGaN / GaN温度传感器的灵敏度比室温附近的常规电阻温度检测器高2倍以上,在900 K左右时的灵敏度也高5倍。这些新型AlGaN / GaN温度传感器可能在诸如太空等极端环境中找到利基应用勘探,以及在宽温度范围内需要高灵敏度的地方。

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  • 来源
    《Japanese journal of applied physics》 |2010年第4issue2期|P.04DF14.1-04DF14.4|共4页
  • 作者单位

    Quantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152-8552, Japan;

    rnQuantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152-8552, Japan;

    rnQuantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152-8552, Japan;

    rnDepartment of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152-8552, Japan State Key Laboratory of New Ceramics and Fine Processing, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China;

    rnState Key Laboratory of New Ceramics and Fine Processing, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China;

    rnQuantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152-8552, Japan Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152-8552, Japan;

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