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机译:CF_4等离子体处理对2纳米厚的HfO_2原子层沉积的光寻址电位传感器的pH和pNa传感特性的影响
Institute of NanoEngineering and Microsystems, National Tsing Hua University, Hsinchu, Taiwan 300, R.O.C.,Department of Electronic Engineering, Chang Gung University, Taoyuan, Taiwan 333, R.O.C.;
Department of Electronic Engineering, Chang Gung University, Taoyuan, Taiwan 333, R.O.C.;
Department of Electronic Engineering, Chang Gung University, Taoyuan, Taiwan 333, R.O.C.;
Department of Electronic Engineering, Chang Gung University, Taoyuan, Taiwan 333, R.O.C.;
Department of Electronic Engineering, Chang Gung University, Taoyuan, Taiwan 333, R.O.C.;
lnotera Memories, Inc., Taoyuan, Taiwan 333, R.O.C.;
Institute of NanoEngineering and Microsystems, National Tsing Hua University, Hsinchu, Taiwan 300, R.O.C.;
Department of Electronic Engineering, Chang Gung University, Taoyuan, Taiwan 333, R.O.C.,Biosensor Group, Biomedical Engineering Center, Chang Gung University, Taoyuan, Taiwan 333, R.O.C.;
机译:O-2等离子体处理对等离子体增强原子层沉积生长SiO2水分阻隔性能的影响
机译:暴露于等离子体处理后原子层沉积生长的HfO_2薄膜的特性
机译:等离子体辅助原子层沉积生长的轻掺杂La:HfO_2薄膜的铁电性能
机译:表面处理和功能化对生长的HfO_2的化学气相沉积和原子层沉积的影响
机译:用于直接板衬和铜扩散阻挡层应用的钌-氮化钛混合相层的等离子体增强原子层沉积。
机译:组成界面和沉积顺序对原子层沉积在硅上生长的纳米Ta2O5-Al2O3薄膜电学性能的影响
机译:在基于SF6的等离子体中通过低温等离子体增强的原子层沉积法生长的氮化铝掩模层的等离子体蚀刻特性
机译:等离子体增强原子层沉积ag薄膜的类似等离子体行为。