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首页> 外文期刊>Japanese journal of applied physics.Part 1.Regular papers & short notes >Deep-Level Characterization of n-GaN Epitaxial Layers Using Transparent Conductive Polyaniline Schottky Contacts
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Deep-Level Characterization of n-GaN Epitaxial Layers Using Transparent Conductive Polyaniline Schottky Contacts

机译:使用透明导电聚苯胺肖特基接触对n-GaN外延层进行深层表征

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摘要

We have successfully investigated surface-related deep levels in n-GaN epilayers with high carrier concentrations by using transparent conductive polyaniline Schottky contacts. High quality Schottky barrier diodes fabricated showed a typical capacitance dispersion phenomenon at ~10 kHz, which is characteristic of conductive polyaniline films with polarization capacitance and resistance components. Steady-state photocapacitance spectroscopy measurements at over this cutoff frequency revealed five photoemission states with their onsets at~1.40, ~1.70,~2.08,~2.64, and ~2.90eV below the conduction band, being identical with the deep levels commonly observed in GaN and AlGaN/GaN. Particularly, the concentrations of the ~1.70 and ~2.90 eV levels were found to increase significantly with decreasing their probing depth range to the near-surface region of the n-GaN layers. Therefore, these levels are probably subject to the surface conditions of the n-GaN layers.
机译:我们已经通过使用透明导电聚苯胺肖特基接触成功地研究了高载流子浓度的n-GaN外延层中与表面有关的深能级。所制造的高质量肖特基势垒二极管在〜10 kHz处表现出典型的电容分散现象,这是具有极化电容和电阻成分的导电聚苯胺薄膜的特征。在该截止频率上进行的稳态光电容光谱测量显示,有五个光发射态,其开始在导带以下〜1.40,〜1.70,〜2.08,〜2.64和〜2.90eV,与在GaN中通常观察到的深能级相同和AlGaN / GaN。特别是,随着对n-GaN层近表面区域的探测深度范围的减小,〜1.70和〜2.90 eV的浓度显着增加。因此,这些水平可能受n-GaN层的表面条件的影响。

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  • 来源
    《Japanese journal of applied physics.Part 1.Regular papers & short notes》 |2011年第1issue2期|p.01AD02.1-01AD02.4|共4页
  • 作者单位

    Institute of Science and Technology Research, Chubu University, 1200 Matsumoto, Kasugai, Aichi 487-8501, Japan;

    Advanced Photovoltaics Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan;

    Advanced Electronic Materials Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan;

    Advanced Photovoltaics Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan;

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