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机译:快速热退火和衬底台面宽度对NiO(111)外延薄膜上周期性直纳米槽阵列自组织形成的影响
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;
Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan;
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan;
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;
机译:溅射在硅(111)衬底上的二氧化铈薄膜的快速热退火:加热速率对微结构和电性能的影响
机译:高质量的外延Cu2O薄膜(111) - 通过快速热氧化从单晶Cu(111)薄膜获得的百分比高原晶粒
机译:射频磁控溅射与快速热退火相结合在A1_2O_3(0001)衬底上外延生长Cr_2O_3薄膜
机译:瞬时退火对房间温度脉冲激光沉积NiO(111)外延薄膜在原子阶梯式蓝宝石(0001)衬底上的纳米级表面形态的影响
机译:基于铜-铟-镓-二硒化物的薄膜太阳能电池的脉冲激光退火和快速热退火。
机译:表面阶跃阶跃调谐在邻近LaAlO3衬底上的高外延CaCu3Ti4O12薄膜的微观结构和介电性能
机译:快速热退火(111)Pt基板上的钛酸锆钛酸铅薄膜的取向
机译:(111)pt基底上快速热退火锆钛酸铅薄膜的取向