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首页> 外文期刊>Japanese journal of applied physics >Influence of Rapid Thermal Annealing and Substrate Terrace Width on Self-Organizing Formation of Periodic Straight Nanogroove Array on NiO(111) Epitaxial Thin Film
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Influence of Rapid Thermal Annealing and Substrate Terrace Width on Self-Organizing Formation of Periodic Straight Nanogroove Array on NiO(111) Epitaxial Thin Film

机译:快速热退火和衬底台面宽度对NiO(111)外延薄膜上周期性直纳米槽阵列自组织形成的影响

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摘要

Room-temperature-grown NiO(111) epitaxial thin films on atomically stepped sapphire (0001) substrates by pulsed laser deposition have straight atomic steps. For a terrace width of about 50 nm, a periodic straight nanogroove array with a depth of about 6 nm was formed over the film surface after rapid thermal annealing. When using a substrate with a terrace width of about 250 nm, it is observed that two types of 180°-rotated triangular crystalline domain are alternately grown on each film terrace divided by the nanogrooves.
机译:通过脉冲激光沉积在原子阶梯状蓝宝石(0001)衬底上室温生长的NiO(111)外延薄膜具有直原子步长。对于约50nm的平台宽度,在快速热退火之后在膜表面上形成深度为约6nm的周期性的直纳米凹槽阵列。当使用具有约250nm的平台宽度的基板时,观察到两种类型的180°旋转的三角形晶畴在每个膜平台上被交替地生长,每个膜平台被纳米槽分开。

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  • 来源
    《Japanese journal of applied physics》 |2012年第6issue2期|p.06FF16.1-06FF16.2|共2页
  • 作者单位

    Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan;

    Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan;

    Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

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