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首页> 外文期刊>Japanese journal of applied physics >Engineering the Lateral Optical Guiding in Gallium Nitride-Based Vertical-Cavity Surface-Emitting Laser Cavities to Reach the Lowest Threshold Gain
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Engineering the Lateral Optical Guiding in Gallium Nitride-Based Vertical-Cavity Surface-Emitting Laser Cavities to Reach the Lowest Threshold Gain

机译:在基于氮化镓的垂直腔表面发射激光腔中进行横向光学引导,以达到最低阈值增益

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摘要

In order to improve the current injection in GaN-based blue vertical-cavity surface-emitting lasers (VCSELs) a dielectric aperture is generally used in combination with an indium-tin-oxide (ITO) layer on the top intracavity p-contact layer. The most straightforward way to realize this introduces a depression of the structure near the optical axis and we show, by using a two-dimensional (2D) effective index method and a three-dimensional (3D) coupled-cavity beam propagation method, that this typically results in optically anti-guided structures with associated high optical losses and thus very high threshold gains. Remarkably, the threshold gain reduces with increased negative guiding, which is due to improved lateral confinement and reduction of lateral leakage. Still, moderately positively guided designs should be preferred to avoid the detrimental effect of lateral leakage and high diffraction loss. To ensure positive index guiding, we propose to planarize the structure or introduce an elevation near the optical axis by additional processing, with an associated reduction in threshold material gain from 6000 to 2000 cm~(-1) for the studied structures.
机译:为了改善在基于GaN的蓝色垂直腔表面发射激光器(VCSEL)中的电流注入,通常将电介质孔径与顶部腔内p型接触层上的氧化铟锡(ITO)层结合使用。实现此目的的最直接方法是在光轴附近引入结构凹陷,并且通过使用二维(2D)有效折射率方法和三维(3D)耦合腔光束传播方法,我们证明了这一点。通常导致具有相关的高光学损耗并因此具有非常高的阈值增益的光学反导结构。明显地,阈值增益随着负向导引的增加而减小,这是由于改善了侧向限制并减少了侧向泄漏。但是,应优先采用中度积极引导的设计,以避免横向泄漏和高衍射损耗的不利影响。为了确保正折射率引导,我们建议通过额外的处理来使结构平面化或在光轴附近引入高程,同时将所研究结构的阈值材料增益从6000降低到2000 cm〜(-1)。

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  • 来源
    《Japanese journal of applied physics》 |2013年第8issue2期|08JG04.1-08JG04.4|共4页
  • 作者单位

    Photonics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg 41296, Sweden;

    Photonics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg 41296, Sweden;

    Photonics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg 41296, Sweden;

    Photonics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg 41296, Sweden;

    Laboratory of Advanced Semiconductors for Photonics and Electronics, Institute of Condensed Matter Physics, Ecole Polytechnique Federate de Lausanne (EPFL), Lausanne CH-1015, Switzerland;

    Laboratory of Advanced Semiconductors for Photonics and Electronics, Institute of Condensed Matter Physics, Ecole Polytechnique Federate de Lausanne (EPFL), Lausanne CH-1015, Switzerland;

    Photonics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg 41296, Sweden;

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