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首页> 外文期刊>Japanese journal of applied physics >Analog design optimization methodology for ultralow-power circuits using intuitive inversion-level and saturation-level parameters
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Analog design optimization methodology for ultralow-power circuits using intuitive inversion-level and saturation-level parameters

机译:使用直观的反相级和饱和级参数的超低功耗电路的模拟设计优化方法

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摘要

A comprehensive design optimization methodology using intuitive nondimensional parameters of inversion-level and saturation-level is proposed, especially for ultralow-power, low-voltage, and high-performance analog circuits with mixed strong, moderate, and weak inversion metal-oxide-semiconductor transistor (MOST) operations. This methodology is based on the synthesized charge-based MOST model composed of Enz-Krummenacher-Vittoz (EKV) basic concepts and advanced-compact-model (ACM) physics-based equations. The key concept of this methodology is that all circuit and system characteristics are described as some multivariate functions of inversion-level parameters, where the inversion level is used as an independent variable representative of each MOST. The analog circuit design starts from the first step of inversion-level design using universal characteristics expressed by circuit currents and inversion-level parameters without process-dependent parameters, followed by the second step of foundry-process-dependent design and the last step of verification using saturation-level criteria. This methodology also paves the way to an intuitive and comprehensive design approach for many kinds of analog circuit specifications by optimization using inversion-level log-scale diagrams and saturation-level criteria. In this paper, we introduce an example of our design methodology for a two-stage Miller amplifier.
机译:提出了一种使用直观的无级参数反演级和饱和级参数的综合设计优化方法,特别是针对混合了强,中,弱反演金属氧化物半导体的超低功耗,低压和高性能模拟电路晶体管(MOST)操作。该方法基于基于电荷的合成MOST模型,该模型由Enz-Krummenacher-Vittoz(EKV)基本概念和基于物理的先进紧凑模型(ACM)方程组成。该方法的关键概念是将所有电路和系统特性描述为反相级别参数的一些多元函数,其中反相级别用作代表每个MOST的自变量。模拟电路设计从第一步的反转级设计开始,首先使用电路电流和反转级参数表示的通用特性(不包含与工艺相关的参数),然后进行与铸造工艺相关的第二步设计,然后进行验证的最后一步使用饱和度级别标准。通过使用反演级对数标度图和饱和度标准进行优化,该方法还为多种模拟电路规格的直观,全面的设计方法铺平了道路。在本文中,我们介绍了两级米勒放大器的设计方法示例。

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  • 来源
    《Japanese journal of applied physics 》 |2014年第4s期| 04EE23.1-04EE23.7| 共7页
  • 作者单位

    Institute of Systems, Information Technologies and Nanotechnologies (ISIT), Fukuoka 814-0001, Japan;

    Institute of Systems, Information Technologies and Nanotechnologies (ISIT), Fukuoka 814-0001, Japan;

    Institute of Systems, Information Technologies and Nanotechnologies (ISIT), Fukuoka 814-0001, Japan;

    Qualiarc Technology Solutions Ltd. (QTS), Fukuoka 814-0001, Japan;

    Institute of Systems, Information Technologies and Nanotechnologies (ISIT), Fukuoka 814-0001, Japan,Department of Advanced Information Technology, Kyushu University, Fukuoka 819-3095, Japan;

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