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Characteristics of vanadium-doped indium oxide thin films for organic light-emitting diodes fabricated by spray chemical vapor deposition

机译:喷涂化学气相沉积制备有机发光二极管用钒掺杂氧化铟薄膜的特性

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摘要

An indium oxide transparent electrode for organic light-emitting diodes was fabricated by the inexpensive spray chemical vapor deposition method. The high work function (5.1 eV) necessary for a transparent anode and a hole-injection layer was successfully achieved with a vanadium doping concentration of 1.5 at.% V without any significant increase in resistivity and surface roughness or loss of transparency. The effect of vanadium doping on indium oxide was systematically investigated. The resistivity, average transmittance in the visible range, and surface roughness (R-a) were 1.08 x 10(-3) Omega cm, 84%, and 4.0 nm, respectively, for the vanadium-doped indium oxide. (c) 2015 The Japan Society of Applied Physics
机译:通过廉价的喷雾化学气相沉积法制造了用于有机发光二极管的氧化铟透明电极。钒掺杂浓度为1.5 at。%V的情况下,成功实现了透明阳极和空穴注入层所需的高功函(5.1 eV),而电阻率和表面粗糙度没有任何显着增加或透明性降低。系统研究了钒掺杂对氧化铟的影响。对于掺杂钒的氧化铟,电阻率,可见光范围内的平均透射率和表面粗糙度(R-a)分别为1.08 x 10(-3)Ωcm,84%和4.0 nm。 (c)2015年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2015年第4期|041101.1-041101.4|共4页
  • 作者单位

    Tokyo Polytech Univ, Grad Sch Engn, Ctr Hyper Media Res, Atsugi, Kanagawa 2430297, Japan;

    Sendai Natl Coll Technol, Dept Intelligent & Elect Syst, Sendai, Miyagi 9893128, Japan;

    Tokyo Polytech Univ, Grad Sch Engn, Ctr Hyper Media Res, Atsugi, Kanagawa 2430297, Japan;

    Tokyo Polytech Univ, Grad Sch Engn, Ctr Hyper Media Res, Atsugi, Kanagawa 2430297, Japan;

    Tokyo Polytech Univ, Grad Sch Engn, Ctr Hyper Media Res, Atsugi, Kanagawa 2430297, Japan;

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