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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Fabrication of Organic Light-Emitting Devices with Indium-Tin-Oxide Anode Prepared by Spray Chemical Vapor Deposition
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Fabrication of Organic Light-Emitting Devices with Indium-Tin-Oxide Anode Prepared by Spray Chemical Vapor Deposition

机译:喷雾化学气相沉积法制备具有铟锡氧化物阳极的有机发光器件

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摘要

Organic light-emitting devices (OLEDs) were fabricated using an indium-tin-oxide (ITO) anode and a small molecular light-emitting material, tris(8-hydroxyquinolinato) aluminum (Al_(q3)). The ITO anode (thickness, 120nm) was prepared inexpensively by spray chemical vapor deposition using ethanol solution consisting of indium chloride and tin chloride onto a glass substrate at 270 °C, which is 80 °C lower than the temperature previously reported by the present authors. The work function and lowest resistivity of the as-deposited anode containing 6.6 at. % Sn were respectively 4.7 V and 3.7 × 10~(-4) Ω-cm. The luminance and turn-on threshold voltage of the OLED were respectively 6500 cd/m~2 and 3.5 V. These values agreed with those of an OLED with the same layer structure but without the commercial ITO anode deposited by physical vapor deposition. The effects of tin concentration in the present ITO anode on the work function and device performance were also investigated.
机译:使用氧化铟锡(ITO)阳极和小分子发光材料三(8-羟基喹啉基)铝(Al_(q3))制造有机发光器件(OLED)。通过在270°C的玻璃基板上使用由氯化铟和氯化锡组成的乙醇溶液,通过喷雾化学气相沉积法廉价地制备ITO阳极(厚度为120nm),该玻璃基板温度比本作者先前报道的温度低80°C 。含6.6 at。的沉积态阳极的功函数和最低电阻率Sn的%分别为4.7V和3.7×10〜(-4)Ω·cm。 OLED的亮度和开启阈值电压分别为6500 cd / m〜2和3.5V。这些值与具有相同层结构但没有通过物理气相沉积来沉积商业ITO阳极的OLED的那些值一致。还研究了当前ITO阳极中锡浓度对功函数和器件性能的影响。

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