...
首页> 外文期刊>Japanese journal of applied physics >Temperature and pulse duration effects on the growth of MgZnO via pulsed metal organic chemical vapor deposition
【24h】

Temperature and pulse duration effects on the growth of MgZnO via pulsed metal organic chemical vapor deposition

机译:温度和脉冲持续时间通过脉冲金属有机化学气相沉积对MgZnO生长的影响

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

The effect of substrate temperature (T-S) and pulse duration (PD) on Mg incorporation, surface quality, and photoresponse properties of MgZnO films grown via PMOCVD were studied. Films grown at T-S ranging from 500 to 700 degrees C but at identical PDs had band gaps varying from 3.38 to 3.87 eV, corresponding to Mg content between x = 0.06 and 0.27. The film with Mg content of 0.27 was the smoothest and achieved at 630 degrees C-optimal TS. Additionally, pulse time effect was studied by growing films at the same T-S but different PDs. A film grown at PD of 12 s has incorporated similar to 40% higher Mg than one grown in a continuous mode (PD -> infinity), indicting the cruciallity of PMOCVD to realize high Mg film. The peak response spectra of photodetectors were also varied with T-S and PD, in accordance with Mg content in the films. (C) 2016 The Japan Society of Applied Physics
机译:研究了衬底温度(T-S)和脉冲持续时间(PD)对通过PMOCVD生长的MgZnO薄膜中Mg掺入,表面质量和光响应特性的影响。在T-S范围从500到700摄氏度,但在相同PD下生长的薄膜,其带隙在3.38至3.87 eV之间变化,对应于x = 0.06至0.27的Mg含量。 Mg含量为0.27的薄膜是最光滑的,并在630摄氏度下达到了最佳TS。另外,通过在相同的T-S但不同的PD下生长薄膜来研究脉冲时间效应。在PD下生长12 s的膜比在连续模式下生长的膜(PD->无穷大)的镁含量高出40%,这表明PMOCVD实现高Mg膜的关键性。光电探测器的峰值响应光谱也随T-S和PD的变化而变化,这取决于薄膜中的Mg含量。 (C)2016年日本应用物理学会

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号