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首页> 外文期刊>Japanese journal of applied physics >Removal of organic template of mesoporous organosilicate thin films using supercritical carbon dioxide fluids
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Removal of organic template of mesoporous organosilicate thin films using supercritical carbon dioxide fluids

机译:使用超临界二氧化碳流体去除中孔有机硅酸盐薄膜的有机模板

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摘要

An organic template of periodic mesoporous organosilicate films was removed using supercritical CO2 fluids that are compressive solvents with a nanopenetration capability. The removal efficiency was evaluated by infrared spectroscopy and refractive index measurements. The removal ratio was dependent on treatment pressure and temperature and improved when the fluid density and/or temperature was high. Because a very high process temperature can deteriorate the organosilicate frame structure, the removal at a low temperature and a high pressure is preferable. The films under supercritical CO2 processing were characterized also in situ ellipsometry. It was found that the removal is a fast process and mostly completes during temperature ramping. (C) 2017 The Japan Society of Applied Physics
机译:使用超临界CO2流体(其为具有纳米渗透能力的压缩溶剂)去除了周期性中孔有机硅酸盐薄膜的有机模板。通过红外光谱和折射率测量来评估去除效率。去除率取决于处理压力和温度,当流体密度和/或温度高时,去除率会提高。由于非常高的处理温度会破坏有机硅酸酯框架的结构,因此优选在低温和高压下去除。在超临界CO 2处理下的膜也被表征为原位椭圆光度法。已经发现,去除是一个快速的过程,并且大部分在温度上升期间完成。 (C)2017日本应用物理学会

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