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首页> 外文期刊>Japanese journal of applied physics >Steep subthreshold swing of pentacene-based organic field-effect transistor with nitrogen-doped LaB6 interfacial layer
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Steep subthreshold swing of pentacene-based organic field-effect transistor with nitrogen-doped LaB6 interfacial layer

机译:具有氮掺杂LaB6界面层的并五苯有机场效应晶体管的陡峭亚阈值摆幅

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摘要

A pentacene-based organic field-effect transistor (OFET) is necessary to work at a low operation voltage and a steep subthreshold swing. The subthreshold swing of pentacene-based OFET was markedly improved by introducing a nitrogen-doped LaB6 interfacial layer (N-doped LaB6 IL) although charge-injection-type hysteresis was observed in ID-VG characteristics. In this study, the thickness dependence of N-doped LaB6 IL for p-type pentacene-based OFET was investigated. A 1.2-2.7-nm-thick N-doped LaB6 IL was deposited on an SiO2 gate insulator by RF sputtering at an RF power of 20-30W. It was found that a 1.2-nm-thick N-doped LaB6 IL realized a steep subthreshold swing of 75mV/dec with a mobility of 0.26cm(2)/(V.s) for p-type pentacene-based OFET. (C) 2017 The Japan Society of Applied Physics
机译:要在较低的工作电压和陡峭的亚阈值摆幅下工作,必须使用并五苯有机场效应晶体管(OFET)。尽管在ID-VG特性中观察到了电荷注入型磁滞现象,但通过引入氮掺杂的LaB6界面层(N掺杂的LaB6 IL),并五苯基于OFET的亚阈值摆动得到了显着改善。在这项研究中,研究了N型LaB6 IL对p型并五苯OFET的厚度依赖性。通过RF溅射以20-30W的RF功率将1.2-2.7nm厚的N掺杂的LaB6 IL沉积在SiO 2栅极绝缘体上。研究发现,对于基于P型并五苯的OFET,1.2 nm厚的N掺杂LaB6 IL实现了75mV / dec的陡峭亚阈值摆幅,且迁移率为0.26cm(2)/(V.s)。 (C)2017日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2017年第4s期|04CL06.1-04CL06.4|共4页
  • 作者单位

    Tokyo Inst Technol, Dept Elect & Elect Engn, Yokohama, Kanagawa 2268502, Japan;

    Tokyo Inst Technol, Dept Elect & Elect Engn, Yokohama, Kanagawa 2268502, Japan;

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