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机译:脉冲激光沉积制备Bi_(0.9)Sr_(0.1)CuSeO外延膜的晶体取向,结晶度和热电性能
Iwate Univ, Fac Sci & Engn, Morioka, Iwate 0208551, Japan;
Iwate Univ, Fac Sci & Engn, Morioka, Iwate 0208551, Japan;
Iwate Univ, Fac Sci & Engn, Morioka, Iwate 0208551, Japan;
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan;
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan;
机译:使用脉冲激光沉积在(001)LaAlO_3单晶上生长的纯锰掺杂无铅Na_(0.5)Bi_(0.5)TiO_3外延薄膜的微波介电性能
机译:通过脉冲激光沉积获得(Bi_(0.9)La_(0.1))_ 2NiMnO_6的外延薄膜
机译:沉积温度对Si衬底上集成的Ba_(0.5)Sr_(0.5)TiO_3外延薄膜结晶度的影响
机译:脉冲激光沉积在各种单晶衬底上生长的无铅铁电Na0.5Bi0.5TiO3薄膜的外延生长和性能
机译:脉冲激光沉积生长的外延YBa2Cu3O7-8薄膜和YBa2Cu3O7-8 / PrBa2Cu3O7-8异质结构的超导性能
机译:在真空和环境氩气中通过脉冲激光沉积制备的TiNi薄膜的组成和晶体性质
机译:通过脉冲激光沉积及其电性能,生长0.1(Bi,Na)TiO 3 sub> -0.9batio 3 sub>外延膜