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首页> 外文期刊>Japanese journal of applied physics >Crystal orientation, crystallinity, and thermoelectric properties of Bi_(0.9)Sr_(0.1)CuSeO epitaxial films grown by pulsed laser deposition
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Crystal orientation, crystallinity, and thermoelectric properties of Bi_(0.9)Sr_(0.1)CuSeO epitaxial films grown by pulsed laser deposition

机译:脉冲激光沉积制备Bi_(0.9)Sr_(0.1)CuSeO外延膜的晶体取向,结晶度和热电性能

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摘要

We have grown Bi0.9Sr0.1CuSeO epitaxial thin films on MgO and SrTiO3 (STO) single-crystal substrates by pulsed laser deposition (PLD) under various growth conditions, and investigated the crystal orientation, crystallinity, chemical composition, and thermoelectric properties of the films. The optimization of the growth conditions was realized in the film grown on MgO at the temperature T-s = 573K and Ar pressure P-Ar = 0.01 Torr in this study, in which there was no misalignment apart from the c-axis and no impurity phase. It was clearly found that the higher crystal orientation of the epitaxial film grown at a higher temperature under a lower Ar pressure mainly enhanced the thermoelectric power factor P (= S-2/rho), where S is the Seebeck coefficient and. is the electrical resistivity. However, the thermoelectric properties of the films were lower than those of polycrystalline bulk because of lattice distortion from lattice mismatch, a low crystallinity caused by a lower T-s, and Bi and Cu deficiencies in the films. (c) 2018 The Japan Society of Applied Physics
机译:我们在各种生长条件下通过脉冲激光沉积(PLD)在MgO和SrTiO3(STO)单晶衬底上生长Bi0.9Sr0.1CuSeO外延薄膜,并研究了其晶体取向,结晶度,化学成分和热电性能。电影。在本研究中,在MgO上以T-s = 573K的温度和Ar压力P-Ar = 0.01托的条件下生长的薄膜中实现了生长条件的优化,其中除c轴外没有错位,并且没有杂质相。清楚地发现,在较高的温度下在较低的Ar压力下生长的外延膜的较高的晶体取向主要增强了热电功率因数P(= S-2 / rho),其中S为塞贝克系数。是电阻率。然而,由于晶格失配引起的晶格畸变,由较低的T-s引起的低结晶度以及膜中Bi和Cu的缺乏,使得膜的热电性能低于多晶体的热电性能。 (c)2018年日本应用物理学会

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