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An experimental study on precision grinding of silicon using diamond grinding pins

机译:用金刚石磨针精磨硅的实验研究

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摘要

Silicon substrates are difficult to grind to good surface finishes using conventional machining. Ductile mode machining is often required to have flawless machining but this requires the use of expensive machine tools. However, precision grinding using conventional machine tools could generate large amounts of ductile streaks on ground silicon surfaces under good machining conditions. High wheel rotation, slow feed rate, small indentations and small grain sizes are the practical requirements to realise precision grinding of silicon. Therefore, this study examines the feasibility of quantitative determination of the criteria to realise precision grinding of silicon on an NC milling machine with factorial experimental design. The result shows massive ductile streaks at depth of cut, 20 μm; feed rate, 6.25 mm/min and spindle speed of 70,000 rpm with a 43 nm R_a. Spindle speed affects mostly the surface finish. The combined effects of depth of cut and feed rate on R_a and R_1 which add to the complexity in the precision grinding process are investigated.
机译:使用常规机加工很难将硅基板研磨至良好的表面光洁度。通常要求球墨铸模加工具有完美的加工,但这需要使用昂贵的机床。然而,在良好的加工条件下,使用常规机床进行的精密研磨会在磨削的硅表面上产生大量的延展性条纹。砂轮转速高,进给速度慢,压痕小和晶粒尺寸小是实现硅精密磨削的实际要求。因此,本研究检验了采用析因实验设计在NC铣床上实现硅精磨标准的定量确定标准的可行性。结果显示在切割深度为20μm时出现大量延展性条纹;进给速度为6.25 mm / min,主轴转速为70,000 rpm,R_a为43 nm。主轴转速主要影响表面光洁度。研究了切削深度和进给速度对R_a和R_1的综合影响,这些影响增加了精密磨削过程的复杂性。

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