机译:在光催化剂BiTaO-4中通过阴离子掺杂进行带隙工程:第一原理计算
Condense Matter Theory Group, Department of Physics and Astronomy, Box 516, Uppsala University, 751 20 Uppsala, Sweden;
Applied Materials Physics, Department of Materials and Engineering, Royal Institute of Technology (KTH), S 100 44 Stockholm, Sweden;
Condense Matter Theory Group, Department of Physics and Astronomy, Box 516, Uppsala University, 751 20 Uppsala, Sweden,Applied Materials Physics, Department of Materials and Engineering, Royal Institute of Technology (KTH), S 100 44 Stockholm, Sweden;
Institute de Fi'sica, Uniuersidade Federal da Bahia, Campus de Ondina, 40 210-340 Salvador, Bahia, Brazil;
Quantum Functional Semiconductor Research Center (QSRC), Donggufe University, 26 Phildong 3ga, Chung gu,Seoul 100-715, Republic of Korea;
Condense Matter Theory Group, Department of Physics and Astronomy, Box 516, Uppsala University, 751 20 Uppsala, Sweden,Applied Materials Physics, Department of Materials and Engineering, Royal Institute of Technology (KTH), S 100 44 Stockholm, Sweden;
band gap engineering; photocatalysis; anionic doping in BiTaO_4;
机译:LaOF掺杂在光催化剂LaOF中的带隙工程:第一性原理研究
机译:五元石墨烯的带隙工程:替代原理:第一性原理计算
机译:早期过渡金属掺杂的锐钛矿型TiO2的带隙工程:第一原理计算
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机译:(N,Ta)掺杂的TiO2的带隙工程:第一性原理计算
机译:用于器件应用的石墨烯带结构和带隙工程的第一性原理研究。