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首页> 外文期刊>International journal of hydrogen energy >Strain and defect engineering of graphene for hydrogen storage via atomistic modelling
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Strain and defect engineering of graphene for hydrogen storage via atomistic modelling

机译:原子造型储氢石墨烯的应变与缺陷工程

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The adsorption of hydrogen molecules on monolayer graphene is investigated using molecular dynamics simulations (MDS). Interatomic interactions of the graphene layer are described using the well-known AIREBO potential, while the interactions between graphene and hydrogen molecule are described using Lennard-Jones potential. In particular, the effect of strain and different point defects on the hydrogen storage capability of graphene is studied. The strained graphene layer is found to be more active for hydrogen and show 6.28 wt% of H-2 storage at 0.1 strain at 77 K temperature and 10 bar pressure. We also studied the effect of temperature and pressure on the adsorption energy and gravimetric density of H-2 on graphene. We considered different point defects in the graphene layer like monovacancy (MV), Stone Wales (SW), 5-8-5 double vacancy (DV), 555-777 DV, and 5555-6-7777 DV which usually occur during the synthesis of graphene. At 100 bar pressure, graphene with 1% concentration of MV defects leads to 9.3 wt% and 2.208 wt% of H-2 storage at 77 K and 300 K, respectively, which is about 42% higher than the adsorption capacity of pristine graphene. Impact of defects on the critical stress and strain of defected graphene layers is also studied. (C) 2021 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.
机译:使用分子动力学模拟(MDS)研究了单层石墨烯上的氢分子的吸附。使用众所周知的Airebo电位描述石墨烯层的网状物相互作用,而使用Lennard-Jones潜力描述石墨烯和氢分子之间的相互作用。特别地,研究了应变和不同点缺陷对石墨烯储氢能力的影响。发现应变的石墨烯层对氢气更活跃,并在77k温度和10巴压力下显示0.1株的H-2储存6.28wt%。我们还研究了温度和压力对石墨烯上H-2的吸附能量和重量密度的影响。我们认为石墨烯层(MV),石威尔士(SW),5-8-5双空位(DV),555-777V和5555-6-7777 DV等石墨烯层中的不同点缺陷在合成期间发生石墨烯。在100巴的压力下,具有1%浓度的MV缺陷的石墨烯分别导致9.3wt%和2.208wt%的H-2储存,分别为比原始石墨烯的吸附容量高约42%。还研究了缺陷对缺陷石墨烯层的临界应力和应变的影响。 (c)2021氢能出版物LLC。 elsevier有限公司出版。保留所有权利。

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