Thermal conduction induced by electron-beam

摘要

The electron-energy deposition profile within the workpiece, induced by a perpendicularly impinging electron-beam, is obtained by solving the electron-beam transport equation via a Monte Carlo approach. The profile serves as the external electron generation in the two-temperature model. The beam is assumed to be a continuous source (not pulsed), and the energy exchange between the electron-beam and the target workpiece occurs at a time scale much shorter than the characteristic time of thermal conduction by electrons and phonons inside the workpiece. A series of numerical results explain the details of the heating phenomena at the nanoscale using an electron-beam.