机译:氨热压釜中GaN单晶生长过程的数值模拟-挡板形状的影响
Research Center for Compact Chemical Process, National Institute of Advanced Industrial Science and Technology, 4-2-1 Nigatake, Miyagino-ku, Sendai 983-8551, Japan;
Research Center for Compact Chemical Process, National Institute of Advanced Industrial Science and Technology, 4-2-1 Nigatake, Miyagino-ku, Sendai 983-8551, Japan;
Mitsubishi Chemical Corporation, 1000, Higashi-Mamiana, Ushiku 300-1295, Japan;
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;
Tohoku University, 6-6-07, Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan;
ammonothermal growth; GaN; temperature; numerical simulation; natural convection; funnel-shaped baffle;
机译:氨热GaN块状晶体生长过程中热和流体流动的数值模拟
机译:GaN晶体的单热生长过程的数值模拟
机译:折流板形状不同的氨热系统中流动模式和热分布的时变3D数值模拟
机译:单晶生长过程水热高压釜数值模拟
机译:氨热晶体生长反应器中流体流动和传质的数值模拟和实验验证
机译:单晶超合金脉冲激光烧蚀的数值模拟考虑综合散热的材料前线和效果
机译:GaN晶体氨热生长过程的数值模拟