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首页> 外文期刊>The International Journal of Advanced Manufacturing Technology >Generating micro-dimples array on the hard chrome-coated surface by modified through mask electrochemical micromachining
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Generating micro-dimples array on the hard chrome-coated surface by modified through mask electrochemical micromachining

机译:通过掩模电化学微加工改性在硬铬涂层表面产生微凹坑阵列

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摘要

It has been recently identified that micro-dimples can act as fluid reservoirs and promote the retention of a lubricating film to reduce friction between mechanical components. Various techniques are employed to produce micro-dimples on the surface of friction pair. In this study, a modified through mask electrochemical micromachining (TMEMM), in which the insulation layer was directly attached to the cathode, was developed to produce micro-dimples on the hard chrome-coated surface. By controlling machining parameters, micro-dimples array, with hundreds of micrometers in diameter and several micrometers in depth, were produced. Compared with the traditional TMEMM, the modified method can both reduce cost and improve machining efficiency. Friction experiments show that the friction coefficient of the surface with appropriate micro-dimples array is obviously lower than that with nondimples.
机译:最近已经发现,微凹痕可以充当流体储存器并促进润滑膜的保持以减少机械部件之间的摩擦。采用多种技术在摩擦副的表面上产生微凹痕。在这项研究中,开发了一种通过掩模电化学微机械加工(TMEMM)的改性方法,其中绝缘层直接附着到阴极上,以在硬铬涂层表面上产生微凹痕。通过控制加工参数,生产出直径为数百微米,深度为几微米的微凹坑阵列。与传统的TMEMM相比,改进的方法既可以降低成本,又可以提高加工效率。摩擦实验表明,适当的微凹坑阵列的表面摩擦系数明显低于非凹坑阵列。

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