首页> 外国专利> Electrochemical micromachining tool and process for through-mask patterning of thin metallic films supported by non-conducting or poorly conducting surfaces

Electrochemical micromachining tool and process for through-mask patterning of thin metallic films supported by non-conducting or poorly conducting surfaces

机译:电化学微加工工具和方法,用于对由不导电或导电不良的表面支撑的金属薄膜进行透掩模图案化

摘要

The present invention describes a high speed, high precision electrochemical micromachining tool, chemical solution and method for the one sided through-mask micropatterning of conducting foils and films supported by insulating material. The tool of the present invention can include either a movable plate means allowing for the movement of the workpiece (20) to and from above the cathode assembly (18), or a movable cathode assembly means allowing for the movement of said cathode assembly to and fro beneath the workpiece. Said cathode assembly also consists of a nozzle assembly from which the electrolytic solution emerges as electrolytic shower and impinges upon the workpiece. Methods to resolve the problems related to the loss of electrical contact during the electrochemical micromachining process are also described.
机译:本发明描述了一种高速,高精度的电化学微加工工具,化学溶液和方法,用于对由绝缘材料支撑的导电箔和膜进行单侧掩模微图案化。本发明的工具可以包括允许工件(20)往返于阴极组件(18)上方移动的可移动板装置,或者允许所述阴极组件往返于阴极组件(18)移动的可移动阴极组件装置。在工件下面。所述阴极组件还包括喷嘴组件,电解溶液从喷嘴组件中出来,作为电解喷淋并撞击到工件上。还描述了解决与电化学微机械加工过程中的电接触损失有关的问题的方法。

著录项

  • 公开/公告号EP0550831B1

    专利类型

  • 公开/公告日1996-02-14

    原文格式PDF

  • 申请/专利权人 IBM;

    申请/专利号EP19920120841

  • 发明设计人 DATTA MADHAV;ROMANKIW LUBOMYR TARAS;

    申请日1992-12-07

  • 分类号C25F3/14;

  • 国家 EP

  • 入库时间 2022-08-22 03:47:45

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