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首页> 外文期刊>IEEE Transactions on Instrumentation and Measurement >TEM-Like Launch Geometries and Simplified De-embedding for Accurate Through Silicon Via Characterization
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TEM-Like Launch Geometries and Simplified De-embedding for Accurate Through Silicon Via Characterization

机译:像TEM一样的发射几何形状和简化的去嵌入功能,可精确地通过硅进行通孔表征

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摘要

Novel de-embedding launch geometries and a simplified analytical procedure are proposed to extract the exact electromagnetic behavior of a through silicon via (TSV) pair from measured data. First, the most recent de-embedding method is reviewed and it is deeply investigated using both 3-D simulation and vector network analyzer measurements to accurately evaluate its residual error. Then, some potential sources of error are hypothesized and overcome by the proposed launch geometries based on a de-embedding plane that is able to ensure a TEM (or quasi-TEM) mode propagation. The novel launches are studied through 3-D simulations; the previous de-embedding procedure is updated to consider the fringing effect of the open-end launch, and it is simplified reducing the launch standards from three to two. The proposed launch geometries and algorithm are shown to be more accurate in the TSV pair de-embedding with respect to the method currently employed.
机译:提出了新颖的去嵌入发射几何形状和简化的分析程序,以从测量数据中提取出硅通孔(TSV)对的精确电磁行为。首先,回顾了最新的去嵌入方法,并使用3-D模拟和矢量网络分析仪测量对其进行了深入研究,以准确评估其残留误差。然后,基于能够确保TEM(或准TEM)模式传播的去嵌入平面,通过所建议的发射几何结构来假设并克服了一些潜在的错误源。通过3-D仿真研究了新颖的发射器;以前的去嵌入过程已更新,以考虑开放式发射的边缘效应,并且简化了发射过程,将发射标准从三个降低为两个。相对于当前采用的方法,所提出的发射几何形状和算法在TSV对解嵌入中显示出了更高的精度。

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