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Thermally stimulated currents in Si: analysis of rate equations

机译:Si 中的热激发电流:速率方程分析

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摘要

Thermally stimulated currents(TSCs)in semiconductors were analyzed theoretically in terms of a single-level model. The rate equations describing TSCs in the single-level model were solved numerically for various process parameters, which made in possible to assess the effect of each parameter on the TSC curve. The effects of physical and instrumental parameters were analyzed: the former characterize the material and Cannot be changed during measurements, and the latter can be varied readily during experiment(applied volt- Age, excitation intensity, etc.).
机译:理论上,根据单能级模型分析了半导体中的热激励电流(TSC)。对于各种过程参数,用数字方法求解了描述单级模型中TSC的速率方程,从而有可能评估每个参数对TSC曲线的影响。分析了物理和仪器参数的影响:前者表征材料并且在测量过程中不能更改,而后者在实验过程中很容易改变(施加电压,激发强度等)。

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