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Thermally Stimulated Currents in Semiconductors: Analysis of Rate Equations for a Single-Level Model And Thermally Stimulated Currents in Si

机译:半导体中的热激励电流:单能级速率方程和Si 中的热激励电流的分析

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摘要

Thermally stimulated currents (TSCs) in semiconductors are analyzed theoretically. The rate equa- tions describing TSCs are soled numerically for various heating profiles, which makes it possible to evaluate the ionization energy, concentration, and capture cross section of traps. The slow and fast retrapping approxi- mations are examined for an arbitrary heating profile. A new approach to TSC data processing is proposed: cleaning of a peak from the lower temperature peak by storing the preilluminated material in the dark at the relaxation temperature of the lower temperature peak.
机译:从理论上分析了半导体中的热激励电流(TSC)。描述TSC的速率方程在数值上适用于各种加热曲线,这使得可以评估离子阱的电离能,浓度和捕获截面。对于任意加热曲线,将检查慢速和快速重新捕集的近似值。提出了一种TSC数据处理的新方法:通过在低温峰的松弛温度下将预照明的材料存储在黑暗中,从低温峰中清除峰。

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